EDN

Updated: Initiative forms around e-beam direct write

SANTA CLARA, Calif.—The eBeam Initiative, a multi-company effort dedicated to the advancement of e-beam direct-write technology for semiconductor prototyping and low-volume manufacturing, launched ...
Business Wire

SCREEN Semiconductor Solutions Partners with Taiwan's National Tsing Hua University to Establish E-Beam Direct Write Lithography Pilot Line to Enable Security Chips with Unique IDs

KYOTO, Japan--(BUSINESS WIRE)--On April 20, 2018, SCREEN Semiconductor Solutions Co., Ltd. (SCREEN) signed a memorandum of understanding (MoU) with National Tsing Hua University (NTHU) in a ceremony ...
EDN

E-beam litho ready to rise again, says Vistec

MUNICH, Germany &#151 Vistec Semiconductor Systems GmbH, formerly known as Leica Microsystems, has claimed that direct writing on wafers using electron beams and conventional lithography do not ...
Semiconductor Engineering

eBeam Initiative Marks Major Milestones Over 15 Years Of Photomasks And Lithography

The eBeam initiative celebrated its 15 th anniversary at the recent SPIE Advanced Lithography + Patterning Conference. 130 members of the mask and lithography community attended the annual lunch to ...
AZOM

KemLab Inc. Offers HARP™ PMMA and Copolymer e-Beam Resists for High-Resolution Lithography Applications

KemLab Inc., a pioneering developer of advanced materials for microelectronics and MEMS applications, is pleased to offer a high-quality solution tailored to address the requirements of ...